Spin Dryer for wafers and other substrates
For
effective drying of wafers and other substrates
after wet cleaning
process
by centrifugal force
Standalone- or fullautomated integration
type available
Maximum
throughput per run:
100 pieces 6" - wafer (4 cassettes)
or
50 peaces 8" - wafer (2 cassettes)
Maximum
revolutions:
1200 rpm
Material:
elektropolished
stainless
steel
