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Sie befinden sich auf: Home » Cleaning and Drying

Cleaning and Drying

Tank Type Megasonic Cleaning System
for various cleanings in semiconductor wet processes
Tankless Megasonic Cleaning System
for cleaning of single substrates such as wafers, masks, LCD-substrates
Spin Dryer
for effective drying of wafers and substrates by centrifugal force
Quartzware and Accessories
Quartz tanks, mixing tanks, quartz carriers and any other kind of quartzware



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