New Megasonic Cleaning System:
Ready for Industry 4.0 applications due to the Ethernet/LAN interface.
- New high performance micro processor control
- USB- and Ethernet- interface (additional to the RS485)
- 5“-TFT-display with touchscreen (parameters can be read and modified directly via touchscreen menu)
- New power output unit with optimized efficiency factor
The new megasonic cleaning system XC1500-ME with optimized homogenity features for high cleaning efficiency, homogenity and repeatability by using the „permanent frequency autotuning system“ is especially designed for the cleaning of substrates with sub-micron structures.
Additionally the new model XC1500-ME has new features for future requirements (Ethernet-interface for Industrie 4.0, USB-interface, TFT-display with touchscreen menu, …)
Stainless Steel Tank
Etching (H2SO4, H2O2, SC-1, SC-2, …) up to 90°C
cleaning of wafers (FR, QDR), masks, LCD-panels, solar cells and other substrates
- Removes particles in the sub-micron area
- Gentle cleansing
- Automatized frequency adjustment for an optimal cleaning result
- Frequency: 1 MHz
- Power Density: up to 5 W/cm²